Invention Grant
- Patent Title: Directed self-assembling composition for pattern formation, and pattern-forming method
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Application No.: US14272587Application Date: 2014-05-08
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Publication No.: US09651861B2Publication Date: 2017-05-16
- Inventor: Yuji Namie , Shinya Minegishi , Tomoki Nagai , Takuo Sone
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-245991 20111109; JP2012-180689 20120816
- Main IPC: C08L53/00
- IPC: C08L53/00 ; C08F297/00 ; G03F7/00 ; H01L21/033 ; H01L21/308 ; H01L21/3213 ; B81C1/00 ; C08F297/02
Abstract:
A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom.
Public/Granted literature
- US09684235B2 Directed self-assembling composition for pattern formation, and pattern-forming method Public/Granted day:2017-06-20
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