Invention Grant
- Patent Title: Compound and composition for forming lower film of resist pattern, and method for forming lower film using same
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Application No.: US14427010Application Date: 2013-09-12
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Publication No.: US09651867B2Publication Date: 2017-05-16
- Inventor: Su-Young Han , Jung-Youl Lee , Jae-Woo Lee , Jae-Hyun Kim
- Applicant: DONGJIN SEMICHEM CO., LTD.
- Applicant Address: KR Incheon
- Assignee: DONGJIN SEMICHEM CO., LTD.
- Current Assignee: DONGJIN SEMICHEM CO., LTD.
- Current Assignee Address: KR Incheon
- Agency: Nath, Goldberg & Meyer
- Agent Tanya E. Harkins; Stanley N. Protigal
- Priority: KR10-2012-0100898 20120912
- International Application: PCT/KR2013/008258 WO 20130912
- International Announcement: WO2014/042443 WO 20140320
- Main IPC: G03F7/11
- IPC: G03F7/11 ; H01L21/027 ; G03F7/09 ; G03F7/00 ; G03F7/16 ; G03F7/40

Abstract:
Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.
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Information query
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