Invention Grant
- Patent Title: Spatial light modulator, exposure apparatus, and method for manufacturing device
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Application No.: US15011145Application Date: 2016-01-29
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Publication No.: US09651871B2Publication Date: 2017-05-16
- Inventor: Soichi Owa , Yoji Watanabe , Tomoharu Fujiwara
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Klarquist Sparkman, LLP
- Priority: JP2010-212850 20100922
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G02B26/06 ; G02B5/09 ; G02B27/42

Abstract:
A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.
Public/Granted literature
- US20160223914A1 SPATIAL LIGHT MODULATOR, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE Public/Granted day:2016-08-04
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