Invention Grant
- Patent Title: Illumination system and lithographic apparatus
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Application No.: US14709135Application Date: 2015-05-11
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Publication No.: US09651875B2Publication Date: 2017-05-16
- Inventor: Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
- Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH
- Applicant Address: NL Veldhoven DE Oberkochen
- Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT GmbH
- Current Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT GmbH
- Current Assignee Address: NL Veldhoven DE Oberkochen
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20

Abstract:
An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
Public/Granted literature
- US20150241792A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2015-08-27
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