Invention Grant
- Patent Title: Lateral bipolar transistor
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Application No.: US15212304Application Date: 2016-07-18
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Publication No.: US09653567B2Publication Date: 2017-05-16
- Inventor: Fabio Carta , Daniel C. Edelstein , Stephen M. Gates , Bahman Hekmatshoartabari , Tak H. Ning
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Alexander G. Jochym
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/66 ; H01L29/735 ; H01L29/08 ; H01L29/10 ; H01L29/423 ; H01L29/06 ; H01L23/29 ; H01L23/31 ; H01L21/311 ; H01L21/3105 ; H01L21/02 ; H01L21/225 ; H01L21/321 ; H01L21/324

Abstract:
A bipolar junction transistor comprises a semiconductor layer disposed on an insulating material, at least a portion of the semiconductor layer forming a base region. The bipolar junction transistor further comprises a transistor emitter laterally disposed on a first side of the base region, where in the transistor emitter is a first doping type and has a first width, and wherein the first width is a lithographic feature size. The bipolar junction transistor further comprises a transistor collector laterally disposed on a second side of the base region, wherein the transistor collector is the first doping type and the first width. The bipolar junction transistor further comprises a central base contact laterally disposed on the base region between the transistor emitter and the transistor collector, wherein the central base contact is a second doping type and has a second width, and wherein the second width is a sub-lithographic feature size.
Public/Granted literature
- US20160359013A1 LATERAL BIPOLAR TRANSISTOR Public/Granted day:2016-12-08
Information query
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