Invention Grant
- Patent Title: Magnetron sputtering coating device, a nano-multilayer film, and the preparation method thereof
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Application No.: US14704246Application Date: 2015-05-05
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Publication No.: US09657390B2Publication Date: 2017-05-23
- Inventor: Gong Jin , Jiangping Tu , Lingling Li , Gang Wang , Meina Wang
- Applicant: ZhongAo HuiCheng Technology Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: ZHONGAO HUICHENG TECHNOLOGY CO., LTD.
- Current Assignee: ZHONGAO HUICHENG TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing
- Priority: CN201210151152 20120515; CN201220218296U 20120515
- Main IPC: C23C14/34
- IPC: C23C14/34
Abstract:
A magnetron sputtering coating device includes a deposition chamber, sputtering cathodes, a rotating stand within the deposition chamber, a support platform on the rotating stand, a first rotation system for driving the rotating stand to rotate around a central axis of the rotating stand, and a baffle fixed on the rotating stand. The sputtering cathodes are arranged around and perpendicular to the rotating stand.
Public/Granted literature
- US20150232981A1 MAGNETRON SPUTTERING COATING DEVICE, A NANO-MULTILAYER FILM, AND THE PREPARATION METHOD THEREOF Public/Granted day:2015-08-20
Information query
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