Invention Grant
- Patent Title: Device for measuring point diffraction interferometric wavefront aberration and method for detecting wave aberration
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Application No.: US14986593Application Date: 2015-12-31
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Publication No.: US09658114B1Publication Date: 2017-05-23
- Inventor: Feng Tang , Xiangzhao Wang , Peng Feng , Fudong Guo , Yunjun Lu
- Applicant: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Applicant Address: CN Shanghai
- Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Current Assignee Address: CN Shanghai
- Agency: Mei & Mark LLP
- Agent Manni Li
- Priority: CN201510982725 20151224
- Main IPC: G01M11/02
- IPC: G01M11/02 ; G01J9/02
Abstract:
A device for measuring point diffraction interferometric wavefront aberration having an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. A method for detecting wavefront aberration of the optical system by using the device is also disclosed.
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