Invention Grant
- Patent Title: Atomic flux measurement device
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Application No.: US13733594Application Date: 2013-01-03
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Publication No.: US09658191B2Publication Date: 2017-05-23
- Inventor: Tadashi Ohachi , Motoi Wada , Osamu Ariyada , Nobuhiko Yamabe
- Applicant: THE DOSHISHA , ARIOS INC.
- Applicant Address: JP Kyoto
- Assignee: THE DOSHISHA
- Current Assignee: THE DOSHISHA
- Current Assignee Address: JP Kyoto
- Agency: Carter, DuLuca, Farrell & Schmidt, LLP
- Agent Robert P. Michal, Esq.
- Priority: JP2010-152658 20100705; JP2010-287599 20101224
- Main IPC: G01N27/70
- IPC: G01N27/70 ; C23C14/54 ; C30B23/00 ; H05H1/00 ; G06F17/00

Abstract:
An atomic flux measurement device for measuring the amount of dissociated atomic flux produced by discharge and emitted from a plasma generation cell into a vacuum camber. The atomic flux measurement device includes a counter electrode body including a pair of first and second sheet-like electrodes that are arranged substantially parallel to each other with a predetermined spacing between them, a direct-current power supply configured to maintain the first sheet-like electrode at a negative potential so that atoms attached to the inner surface of the sheet-like electrode undergo self-ionization and to apply a direct-current voltage between the first and second sheet-like electrodes so that a current flows between the first and second sheet-like electrodes, and a direct-current ammeter configured to measure a current flowing due to electrons emitted by the self-ionization of the dissociated atoms attached to the inner surface of the first sheet-like electrode.
Public/Granted literature
- US20130124124A1 ATOMIC FLUX MEASUREMENT DEVICE Public/Granted day:2013-05-16
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