Invention Grant
- Patent Title: Diffractive optics element, method for manufacturing diffractive optics element, and electronic device
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Application No.: US14281119Application Date: 2014-05-19
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Publication No.: US09658464B2Publication Date: 2017-05-23
- Inventor: Hidemitsu Sorimachi , Shigeo Nojima
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: ALG Intellectual Property, LLC
- Priority: JP2013-107728 20130522
- Main IPC: G02B27/42
- IPC: G02B27/42
Abstract:
A diffractive optics element includes a substrate configured of a sapphire substrate and a diffractive optics structure, provided on the substrate, that forms an image when a laser beam is incident thereon. The diffractive optics structure has a diffractive optics portion, and the diffractive optics portion has a base material and a diffractive optics layer disposed on the base material. The thickness of the base material is no greater than 20 μm.
Public/Granted literature
- US20140347732A1 DIFFRACTIVE OPTICS ELEMENT, METHOD FOR MANUFACTURING DIFFRACTIVE OPTICS ELEMENT, AND ELECTRONIC DEVICE Public/Granted day:2014-11-27
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