Invention Grant
- Patent Title: Mask pellicle indicator for haze prevention
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Application No.: US14754902Application Date: 2015-06-30
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Publication No.: US09658526B2Publication Date: 2017-05-23
- Inventor: Kuan-Wen Lin , Sheng-Chi Chin , Ting-Hao Hsu , Tzu-Ting Chou , Shu-Hsien Wu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64 ; G03B27/62

Abstract:
A pellicle mask assembly includes a mask, a pellicle frame, and a pellicle membrane. The pellicle frame has a bottom side attached to the mask, and a top side covered by the pellicle membrane. The pellicle frame includes a coating on its inner surface and the coating is configured to monitor a change of environment inside the pellicle mask assembly. In embodiments, the change of environment includes increased humidity and/or increased chemical ion density inside the pellicle mask assembly. Methods of making and using the pellicle mask assembly are also disclosed.
Public/Granted literature
- US20170003585A1 Mask Pellicle Indicator for Haze Prevention Public/Granted day:2017-01-05
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