• Patent Title: Methods and systems for printing periodic patterns
  • Application No.: US14778324
    Application Date: 2014-03-18
  • Publication No.: US09658535B2
    Publication Date: 2017-05-23
  • Inventor: Francis ClubeHarun SolakChristian Dais
  • Applicant: EULITHA A.G.
  • Applicant Address: CH Wurenlingen
  • Assignee: Eulitha A.G.
  • Current Assignee: Eulitha A.G.
  • Current Assignee Address: CH Wurenlingen
  • Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
  • International Application: PCT/IB2014/059949 WO 20140318
  • International Announcement: WO2014/147562 WO 20140925
  • Main IPC: G03B27/54
  • IPC: G03B27/54 G03F7/20
Methods and systems for printing periodic patterns
Abstract:
A method for printing a periodic pattern of features into a photosensitive layer includes providing a mask bearing a periodic pattern, providing a substrate bearing the photosensitive layer, and arranging the substrate substantially parallel to the mask. A beam of collimated monochromatic light is formed for illuminating the mask pattern so that the light-field transmitted by the mask forms Talbot image planes separated by a Talbot distance. N sub-exposures of the mask with the beam are performed and the separation between sub-exposures are changed so that the relative separation during the ith sub-exposure with respect to that during the first sub-exposure is given by (mi+ni/N) times the Talbot distance. The mask pattern is exposed to the same energy density of illumination for each sub-exposure, wherein the period is selected in relation to the wavelength so that only the zeroth and first diffraction orders are transmitted by the mask.
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