Invention Grant
- Patent Title: Memory having an interlayer insulating structure with different thermal resistance
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Application No.: US15175859Application Date: 2016-06-07
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Publication No.: US09659998B1Publication Date: 2017-05-23
- Inventor: Hsiang-Lan Lung
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L27/24 ; H01L23/528 ; H01L45/00 ; G11C13/00

Abstract:
An integrated circuit memory comprises an intermediate layer disposed between a plurality of bit lines in a bit line conductor layer and a plurality of word lines in a word line conductor layer. The intermediate layer includes a plurality of memory posts through an interlayer insulating structure. Each memory post has a memory element and an access element. The interlayer insulating structure includes higher thermal resistance at the level of the memory element than at the level of the access element.
Information query
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