Invention Grant
- Patent Title: Carrier substrate and manufacturing method thereof
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Application No.: US13965194Application Date: 2013-08-13
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Publication No.: US09661761B2Publication Date: 2017-05-23
- Inventor: Chun-Ting Lin
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: Jianq Chyun IP Office
- Priority: TW102116745A 20130510
- Main IPC: H05K3/46
- IPC: H05K3/46 ; H05K3/40 ; H05K3/06 ; H01L23/00

Abstract:
A carrier substrate includes an insulation layer, conductive towers and a circuit structure layer. A diameter of each of the conductive towers is increased gradually from a top surface to a bottom surface, and the conductive towers include first conductive towers and second conductive towers surrounding the first conductive towers. The circuit structure layer is disposed on the insulation layer and includes at least one dielectric layer, at least two circuit layers and first conductive vias. Each of the second conductive towers correspondingly connects to at least two of the first conductive vias, and each of the first conductive towers correspondingly connects to one of the first conductive vias. An interface exists between the first conductive vias and the first and the second conductive towers.
Public/Granted literature
- US20140332252A1 CARRIER SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2014-11-13
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