- Patent Title: Semiconductor memory device and method for manufacturing the same
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Application No.: US15010623Application Date: 2016-01-29
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Publication No.: US09666596B2Publication Date: 2017-05-30
- Inventor: Tomohiro Takamatsu
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L49/02 ; H01L27/11582 ; H01L27/11573

Abstract:
According to one embodiment a semiconductor memory device includes a first stacked body, a pillar, a memory film, a capacitive element, a first wiring, and a second wiring. The capacitive element includes a first conductive member and a second conductive member. A first length of the first conductive member in a first direction is larger than a second length of the first conductive member in a second direction crossing the first direction. A third length of the first conductive member in a third direction crossing the first direction and the second direction is larger than the second length. A fourth length of the second conductive member in the first direction is larger than a fifth length of the second conductive member in the second direction. A sixth length of the second conductive member in the third direction is larger than the fifth length.
Public/Granted literature
- US20170062461A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-03-02
Information query
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