Invention Grant
- Patent Title: RF power transistor
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Application No.: US15088909Application Date: 2016-04-01
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Publication No.: US09666685B2Publication Date: 2017-05-30
- Inventor: Shuo-Hung Hsu , Chuan-Wei Tsou , Yi-Wei Lien
- Applicant: National Tsing Hua University
- Applicant Address: TW Hsinchu
- Assignee: NATIONAL TSING HUA UNIVERSITY
- Current Assignee: NATIONAL TSING HUA UNIVERSITY
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L29/66 ; H01L29/778 ; H01L29/06 ; H01L29/417

Abstract:
A radio frequency (RF) power transistor includes a semiconductor heterostructure, a gate electrode, a drain electrode and a source electrode. The drain electrode includes an ohmic contact and a Schottky contact extending from the ohmic contact toward the gate electrode, spaced apart from the gate electrode (4) by a distance (LGD), and having a length (LEXT) being not less than 2 μm and not greater than 4 μm. A ratio of the length (LEXT) to a sum of the length (LEXT) and a distance (LGD) is greater than 0.83 and less than 0.98.
Public/Granted literature
- US20160218205A1 RF POWER TRANSISTOR Public/Granted day:2016-07-28
Information query
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