Invention Grant
- Patent Title: Liquid crystal device, method of manufacturing liquid crystal device, and electronic apparatus
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Application No.: US14593084Application Date: 2015-01-09
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Publication No.: US09670411B2Publication Date: 2017-06-06
- Inventor: Naoki Tomikawa
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: ALG Intellectual Property, LLC
- Priority: JP2014-003961 20140114
- Main IPC: G02F1/1337
- IPC: G02F1/1337 ; C09K19/56

Abstract:
There is provided a liquid crystal device including an element substrate, a counter substrate which is arranged to face the element substrate, a liquid crystal layer which is arranged between the element substrate and the counter substrate, and inorganic alignment films which are arranged between the element substrate and the liquid crystal layer and between the counter substrate and the liquid crystal layer. A silane compound film with which a fullerene is modified is arranged to cover the inorganic alignment film.
Public/Granted literature
- US20150198827A1 LIQUID CRYSTAL DEVICE, METHOD OF MANUFACTURING LIQUID CRYSTAL DEVICE, AND ELECTRONIC APPARATUS Public/Granted day:2015-07-16
Information query
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