Invention Grant
- Patent Title: Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
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Application No.: US14441338Application Date: 2013-10-02
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Publication No.: US09671688B2Publication Date: 2017-06-06
- Inventor: Seung-Wook Shin , Yun-Jun Kim , Hea-Jung Kim , Youn-Jin Cho , Yoo-Jeong Choi
- Applicant: CHEIL INDUSTRIES INC.
- Applicant Address: KR Gumi-Si, Gyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-Si, Gyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0157570 20121228
- International Application: PCT/KR2013/008836 WO 20131002
- International Announcement: WO2014/104544 WO 20140703
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/09 ; G03F7/11 ; G03F7/26 ; G03F7/30 ; G03F7/40 ; G03F7/16 ; G03F7/36 ; C07C65/34 ; C07C65/32 ; C07C65/40 ; C07C63/15 ; C07C63/26 ; G03F1/00
Abstract:
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A′, L, L′, X and n are the same as defined in the specification.
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