Invention Grant
- Patent Title: Pattern generation method
-
Application No.: US13908773Application Date: 2013-06-03
-
Publication No.: US09672300B2Publication Date: 2017-06-06
- Inventor: Koji Mikami , Tadashi Arai , Hiroyuki Ishii
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2012-131117 20120608
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/36 ; G03F1/70

Abstract:
A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.
Public/Granted literature
- US20130329202A1 PATTERN GENERATION METHOD Public/Granted day:2013-12-12
Information query