Invention Grant
- Patent Title: Formation of connectors without UBM
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Application No.: US14630265Application Date: 2015-02-24
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Publication No.: US09673158B2Publication Date: 2017-06-06
- Inventor: Tsung-Ding Wang , Hung-Jen Lin , Chien-Hsun Lee
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/56 ; H01L23/31 ; H01L23/29

Abstract:
A device includes a substrate, a metal pad over the substrate, and a passivation layer having a portion over the metal pad. A post-passivation interconnect (PPI) is electrically coupled to the metal pad, wherein the PPI includes a portion over the metal pad and the passivation layer. A polymer layer is over the PPI. A solder ball is over the PPI. A compound includes a portion adjoining the solder ball and the polymer layer, wherein the compound includes flux and a polymer.
Public/Granted literature
- US20150171037A1 Formation of Connectors without UBM Public/Granted day:2015-06-18
Information query
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