Invention Grant
- Patent Title: Method and apparatus for a wafer seal ring
-
Application No.: US13759201Application Date: 2013-02-05
-
Publication No.: US09673169B2Publication Date: 2017-06-06
- Inventor: Yi-Chuan Teng , Jung-Huei Peng , Shang-Ying Tsai , Hsin-Ting Huang , Li-Min Hung , Yao-Te Huang , Chin-Yi Cho
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/00 ; H01L23/10

Abstract:
A wafer seal ring may be formed on a wafer having a pattern structure with a pattern density. The wafer seal ring pattern structure may include a plurality of lines having a width and a spacing that may be approximately equal to a width and a spacing of die bond rings on the wafer. The wafer having the wafer seal ring formed thereon may be bonded to a wafer that may not have a wafer seal ring. A pair of wafers may be formed with respective wafer seal rings formed in a corresponding manner. The pair of wafers may be bonded together with the wafer seal rings aligned and bonded together to form a seal ring structure between the bonded wafers.
Public/Granted literature
- US20140220735A1 Method and Apparatus for a Wafer Seal Ring Public/Granted day:2014-08-07
Information query
IPC分类: