Invention Grant
- Patent Title: Shallow trench isolation trenches and methods for NAND memory
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Application No.: US14670362Application Date: 2015-03-26
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Publication No.: US09673274B2Publication Date: 2017-06-06
- Inventor: Yusuke Yoshida
- Applicant: SanDisk Technologies Inc.
- Applicant Address: US TX Plano
- Assignee: SanDisk Technologies LLC
- Current Assignee: SanDisk Technologies LLC
- Current Assignee Address: US TX Plano
- Agency: Vierra Magen Marcus LLP
- Main IPC: H01L21/70
- IPC: H01L21/70 ; H01L29/06 ; H01L21/762 ; H01L27/11524 ; H01L27/11529

Abstract:
A NAND memory is provided that includes a memory cell region and a peripheral region. The peripheral region includes a shallow trench isolation trench disposed in a substrate. The shallow trench isolation trench has a first tab extension and a second tab extension. The first tab extension is disposed at a top portion of the shallow trench isolation trench, and extends in a first direction from the shallow trench isolation trench. The second tab extension is disposed at a top portion of the shallow trench isolation trench, and extends in a second direction from the shallow trench isolation trench.
Public/Granted literature
- US20160284798A1 SHALLOW TRENCH ISOLATION TRENCHES AND METHODS FOR NAND MEMORY Public/Granted day:2016-09-29
Information query
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