Invention Grant
- Patent Title: Rectifier circuit including transistor whose channel formation region includes oxide semiconductor
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Application No.: US13034722Application Date: 2011-02-25
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Publication No.: US09673335B2Publication Date: 2017-06-06
- Inventor: Koichiro Kamata
- Applicant: Koichiro Kamata
- Applicant Address: JP Kanagawa-ken
- Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2010-049159 20100305
- Main IPC: H02M7/217
- IPC: H02M7/217 ; H01L29/786 ; H01L27/12 ; H01L27/06 ; H01L27/08

Abstract:
In a rectifier circuit, by using a transistor whose off-state current is small as a so-called diode-connected MOS transistor included in the rectifier circuit, breakdown which is caused when a reverse bias is applied is prevented. Thus, an object is to provide a rectifier circuit whose reliability is increased and rectification efficiency is improved. A gate and a drain of a transistor are both connected to a terminal of the rectifier circuit to which an AC signal is input. In the transistor, an oxide semiconductor is used for a channel formation region and the off-state current at room temperature is less than or equal to 10−20 A/μm, which is equal to 10 zA/μm (z: zepto), when the source-drain voltage is 3.1 V.
Public/Granted literature
- US20110216566A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2011-09-08
Information query
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