- Patent Title: Compound semiconductor device and method of manufacturing the same
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Application No.: US15012268Application Date: 2016-02-01
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Publication No.: US09673377B2Publication Date: 2017-06-06
- Inventor: Naoya Okamoto
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Fujitsu Patent Center
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/00 ; H01L41/113 ; H01L41/047 ; H01L41/187 ; H01L41/29 ; H01L41/332 ; H02N2/18 ; H01L41/316 ; H01L21/02 ; H01L29/20 ; H01L29/205 ; H01L41/08 ; H01L41/16 ; H01L41/39

Abstract:
A compound semiconductor device includes: a flexible part; a first nitride semiconductor layer above a surface of the flexible part, the first nitride semiconductor layer including a first polar plane and a second polar plane intersecting the surface; a second nitride semiconductor layer in contact with the first nitride semiconductor layer on the first polar plane, a lattice constant of the second nitride semiconductor layer being different from that of the first nitride semiconductor layer; a third nitride semiconductor layer in contact with the first nitride semiconductor layer on the second polar plane, a lattice constant of the third nitride semiconductor layer being different from that of the first nitride semiconductor layer; a first ohmic electrode above an interface between the first nitride semiconductor layer and the second nitride semiconductor layer; and a second ohmic electrode above an interface between the first nitride semiconductor layer and the third nitride semiconductor layer.
Public/Granted literature
- US20160149118A1 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2016-05-26
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