Invention Grant
- Patent Title: Seed layer for growth of <111> magnetic materials
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Application No.: US15079463Application Date: 2016-03-24
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Publication No.: US09673385B1Publication Date: 2017-06-06
- Inventor: Huanlong Liu , Ru-Ying Tong , Guenole Jan
- Applicant: Headway Technologies, Inc.
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/10 ; H01L43/08 ; H01L43/12

Abstract:
A seed layer stack with a smooth top surface having a peak to peak roughness of about 0.5 nm over a range of 100 nm is formed by sputter depositing an X layer such as Mo on a Ni layer where the X layer has one or both of a larger bond energy and a greater atomic number than Ni. A (Ni/X)m laminate is formed and then an uppermost NiCr seed layer is deposited to enhance perpendicular magnetic anisotropy (PMA) in an overlying ferromagnetic layer. A NiCr crystal structure promotes texture in the ferromagnetic layer. X layers serve as a diffusion barrier to Ta migration from a bottom electrode and have good lattice matching with the adjoining Ni layer and uppermost NiCr layer. As a result of the smooth seed layer stack in a magnetic tunnel junction (MTJ), MTJ properties are improved and more reproducible.
Information query
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