Invention Grant
- Patent Title: Control method of plasma by magnetic field in an exhaust gas treating apparatus and an exhaust gas treating apparatus using the same
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Application No.: US12752537Application Date: 2010-04-01
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Publication No.: US09675930B2Publication Date: 2017-06-13
- Inventor: Toshio Awaji , Takashi Nakayama , Toshio Tanaka
- Applicant: Toshio Awaji , Takashi Nakayama , Toshio Tanaka
- Applicant Address: JP Osaka
- Assignee: CLEAN TECHNOLOGY CO., LTD.
- Current Assignee: CLEAN TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2009-090066 20090402
- Main IPC: B01D53/32
- IPC: B01D53/32 ; H05H1/50

Abstract:
A plasma control method for an exhaust gas treating apparatus includes providing an exhaust gas treating apparatus having a plasma discharge space, a coil disposed on an outer circumference of the plasma discharge space, an upper electrode, and a lower electrode; generating plasma in the plasma discharge space; controlling the state of the plasma generated in the plasma discharge space by generating a magnetic field in the plasma discharge space between the upper electrode and the lower electrode; and cooling the reaction tube using a water cooled jacket disposed around the reaction tube. The magnetic field is generated by applying a current to the coil.
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