Invention Grant
- Patent Title: Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition
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Application No.: US15065119Application Date: 2016-03-09
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Publication No.: US09676892B2Publication Date: 2017-06-13
- Inventor: Myeong koo Kim , Ahreum Choi , Boodeuk Kim , Songse Yi , Jungsik Choi
- Applicant: Myeong koo Kim , Ahreum Choi , Boodeuk Kim , Songse Yi , Jungsik Choi
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2015-0033252 20150310
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/40 ; C08G16/02 ; H01L21/02 ; C08G12/08 ; C08G65/38 ; C08G75/14 ; C08G12/26 ; G03F7/09 ; C08F216/10 ; G03F7/30 ; G03F7/36 ; H01L21/311 ; G03F7/11 ; H01L21/033
Abstract:
The present inventive concepts relate to a polymer for a hard mask, a hard mask composition including a polymer for a hard mask as described herein, and a method for forming a pattern of a semiconductor device using a hard mask composition as described herein. The polymer includes a structure represented by the following chemical formula 1. In chemical formula 1, “A”, “Q”, “L”, “R1”, “R2”, “R3”, and “n” are the same as defined in the specification.
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