Invention Grant
- Patent Title: Membrane design for reducing defects in electroplating systems
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Application No.: US14256770Application Date: 2014-04-18
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Publication No.: US09677190B2Publication Date: 2017-06-13
- Inventor: Doyeon Kim , Shantinath Ghongadi , Yuichi Takada , Ludan Huang , Tariq Majid
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: C25B13/04
- IPC: C25B13/04 ; B01D61/48 ; C25B9/00 ; C25B9/10 ; C25B9/08 ; C25C7/04 ; C25D17/00

Abstract:
Certain embodiments disclosed herein pertain to methods and apparatus for electrodepositing material on a substrate. More particularly, a novel membrane for separating the anode from the cathode/substrate, and a method of using such a membrane are presented. The membrane includes at least an ion exchange layer and a charge separation layer. The disclosed embodiments are beneficial for maintaining relatively constant concentrations of species in the electrolyte over time, especially during idle (i.e., non-electroplating) times.
Public/Granted literature
- US20150122658A1 MEMBRANE DESIGN FOR REDUCING DEFECTS IN ELECTROPLATING SYSTEMS Public/Granted day:2015-05-07
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