Invention Grant
- Patent Title: Apparatus and method for inspection of substrate defect
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Application No.: US14795396Application Date: 2015-07-09
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Publication No.: US09678020B2Publication Date: 2017-06-13
- Inventor: Joon-Seo Song , Woo-seok Ko , Ji-Young Shin , Seong-Jin Yun , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
- Applicant: Joon-Seo Song , Woo-seok Ko , Ji-Young Shin , Seong-Jin Yun , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
- Applicant Address: KR Geyonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Geyonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2014-0095832 20140728
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01N21/88 ; G01N21/956

Abstract:
Example embodiments relate to an apparatus and method for inspecting a substrate defect. The substrate defect inspecting apparatus includes a substrate, a light source emitting an infrared beam to the substrate, a detector detecting the infrared beam reflected from the substrate, and a defect analyzer receiving first information and second information from the detector and analyzing defects existing in the substrate. According to at least one example embodiment, the second information is acquired during a later process than the first information.
Public/Granted literature
- US20160025654A1 APPARATUS AND METHOD FOR INSPECTION OF SUBSTRATE DEFECT Public/Granted day:2016-01-28
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