Invention Grant
- Patent Title: Method and apparatus for inspecting defects
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Application No.: US14821075Application Date: 2015-08-07
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Publication No.: US09678021B2Publication Date: 2017-06-13
- Inventor: Yuta Urano , Toshifumi Honda
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2014-162012 20140808
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/956 ; G01N21/95

Abstract:
In optical dark field defect inspection, the present invention provides including: condensing laser emitted from a light source in a line shape; reflecting the laser, with a mirror; irradiating the reflected laser via an objective lens to a sample placed on a table from a vertical direction; condensing reflected scattered light from the sample with the objective lens; shielding diffraction light occurred from a periodical pattern formed on the sample, in the reflected scattered light from the sample and scattered light occurred from the mirror, with a spatial filter; receiving the reflected scattered light from the sample, not shielded with the spatial filter, with an imaging lens, and forming an image of the reflected scattered light; detecting the image of the reflected scattered light; and processing a detection signal obtained by detecting the image of the reflected scattered light and detecting a defect on the sample.
Public/Granted literature
- US20160041092A1 METHOD AND APPARATUS FOR INSPECTING DEFECTS Public/Granted day:2016-02-11
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