Invention Grant
- Patent Title: Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
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Application No.: US14664576Application Date: 2015-03-20
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Publication No.: US09678332B2Publication Date: 2017-06-13
- Inventor: Osamu Tanitsu
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2007-287987 20071106
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G02B26/08 ; G02B27/09 ; G03F7/20 ; G02B26/02

Abstract:
To optionally forming a multilevel light intensity distribution on an illumination pupil plane, the illumination apparatus implements Köhler illumination on an illumination target surface, using as a light source the light intensity distribution formed on the illumination pupil plane on the basis of light from a light source. The illumination apparatus has a spatial light modulator, a condensing optical system, and a controller. The spatial light modulator has reflecting surfaces which are two-dimensionally arranged and postures of which can be controlled independently of each other. The condensing optical system condenses light from the reflecting surfaces to form a predetermined light intensity distribution on the illumination pupil plane. The controller controls the number of reflecting surfaces contributing to arriving light, for each of points on the illumination pupil plane forming the light intensity distribution, according to a light intensity distribution to be formed on the illumination pupil plane.
Public/Granted literature
- US20150212424A1 ILLUMINATION APPARATUS, ILLUMINATION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-07-30
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