Invention Grant
- Patent Title: Photosensitive resin composition and photosensitive resin printing plate original
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Application No.: US14418710Application Date: 2013-07-30
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Publication No.: US09678424B2Publication Date: 2017-06-13
- Inventor: Tsutomu Abura , Shuhei Yabuki
- Applicant: TORAY INDUSTRIES, INC.
- Applicant Address: JP Tokyo
- Assignee: TORAY INDUSTRIES, INC.
- Current Assignee: TORAY INDUSTRIES, INC.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-169411 20120731; JP2012-169412 20120731
- International Application: PCT/JP2013/070615 WO 20130730
- International Announcement: WO2014/021322 WO 20140206
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/031 ; G03F7/027 ; G03F7/037 ; G03F7/038 ; G03F7/32 ; G03F7/033

Abstract:
[Problem] To provide a photosensitive resin composition which exhibits excellent relief image reproducibility and improved toughness and printing durability, and a photosensitive resin printing plate precursor. [Solution] A photosensitive resin composition which is characterized by containing (A) a modified and partially saponified poly(vinyl acetate) having a reactive group in a side chain, (B) a polyamide having a basic nitrogen atom, (C) a compound having a molecular weight of 300 or lower, a 5-7 membered ring and a polymerizable ethylenic double bond, and (D) a photopolymerization initiator.
Public/Granted literature
- US20150205201A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN PRINTING PLATE ORIGINAL Public/Granted day:2015-07-23
Information query
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