Invention Grant
- Patent Title: Composition and process for stripping photoresist from a surface including titanium nitride
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Application No.: US14401732Application Date: 2013-05-17
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Publication No.: US09678430B2Publication Date: 2017-06-13
- Inventor: Emanuel I. Cooper , Marc Conner , Michael Owens
- Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
- Applicant Address: US MA Billerica
- Assignee: Entegris, Inc.
- Current Assignee: Entegris, Inc.
- Current Assignee Address: US MA Billerica
- Agency: Entegris, Inc. Legal Dept.
- Agent Nidhi G. Kissoon
- International Application: PCT/US2013/041629 WO 20130517
- International Announcement: WO2013/173738 WO 20131121
- Main IPC: C11D7/08
- IPC: C11D7/08 ; G03F7/42 ; H01L21/311 ; C11D3/04 ; C11D3/36
Abstract:
A method and low pH compositions for removing bulk and/or hardened photoresist material from microelectronic devices have been developed. The low pH compositions include sulfuric acid and at least one phosphorus-containing acid. The low pH compositions effectively remove the hardened photoresist material while not damaging the underlying silicon-containing layer(s) or the metal gate materials.
Public/Granted literature
- US20150168843A1 COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE Public/Granted day:2015-06-18
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