Invention Grant
- Patent Title: Exposure apparatus and exposure method, and device manufacturing method
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Application No.: US14432522Application Date: 2013-10-02
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Publication No.: US09678433B2Publication Date: 2017-06-13
- Inventor: Yuichi Shibazaki
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-219952 20121002
- International Application: PCT/JP2013/076820 WO 20131002
- International Announcement: WO2014/054690 WO 20140410
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/20 ; G01B11/26 ; G01B11/00 ; H01J37/304 ; H01J37/317

Abstract:
In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
Public/Granted literature
- US20150286147A1 EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-10-08
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