Invention Grant
- Patent Title: Apparatus and method for treating substrate
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Application No.: US13537914Application Date: 2012-06-29
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Publication No.: US09679788B2Publication Date: 2017-06-13
- Inventor: Eunsun Jung , Woo Young Kim , Chan Young Heo , Jeong Seon Park
- Applicant: Eunsun Jung , Woo Young Kim , Chan Young Heo , Jeong Seon Park
- Applicant Address: KR Chungcheongnam-Do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-Do
- Agency: Harness, Dickey & Pierce, PLC
- Priority: KR10-2011-0064987 20110630; KR10-2011-0104768 20111013
- Main IPC: F26B5/00
- IPC: F26B5/00 ; H01L21/67
Abstract:
Provided are an apparatus and method for treating a substrate, and more particularly, to an apparatus and method for treating a substrate using a supercritical fluid. The apparatus for treating a substrate includes a process chamber in which an organic solvent remaining on a substrate is dissolved using a fluid provided as a supercritical fluid to dry the substrate and a recycling unit in which the organic solvent is separated from the fluid discharged from the process chamber to recycle the fluid.
Public/Granted literature
- US20130000140A1 APPARATUS AND METHOD FOR TREATING SUBSTRATE Public/Granted day:2013-01-03
Information query
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