Invention Grant
- Patent Title: Evaluation method of device wafer
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Application No.: US14752155Application Date: 2015-06-26
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Publication No.: US09679820B2Publication Date: 2017-06-13
- Inventor: Naoya Sukegawa , Seiji Harada
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2014-132279 20140627
- Main IPC: G01N21/55
- IPC: G01N21/55 ; H01L21/66 ; G01N21/95

Abstract:
An evaluation method of a device wafer on which plural devices are formed on a front surface and inside which a gettering layer is formed is provided. In the evaluation method, electromagnetic waves are radiated toward a back surface of the device wafer and excitation light is radiated to generate excess carriers. Furthermore, the gettering capability of the gettering layer formed in the device wafer is determined based on the damping time of reflected electromagnetic waves.
Public/Granted literature
- US20150377779A1 EVALUATION METHOD OF DEVICE WAFER Public/Granted day:2015-12-31
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