Invention Grant
- Patent Title: Semiconductor device and method of forming interconnect substrate for FO-WLCSP
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Application No.: US13243214Application Date: 2011-09-23
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Publication No.: US09679863B2Publication Date: 2017-06-13
- Inventor: Yaojian Lin , Jianmin Fang , Xia Feng , Kang Chen
- Applicant: Yaojian Lin , Jianmin Fang , Xia Feng , Kang Chen
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L21/56 ; H01L25/10 ; H01L25/00 ; H01L23/498 ; H01L23/538 ; H01L23/31 ; H01L21/683

Abstract:
A semiconductor device has a first encapsulant deposited over a first carrier. A plurality of conductive vias is formed through the first encapsulant to provide an interconnect substrate. A first semiconductor die is mounted over a second carrier. The interconnect substrate is mounted over the second carrier adjacent to the first semiconductor die. A second semiconductor die is mounted over the second carrier adjacent to the interconnect substrate. A second encapsulant is deposited over the first and second semiconductor die, interconnect substrate, and second carrier. A first interconnect structure is formed over a first surface of the second encapsulant and electrically connected to the conductive vias. A second interconnect structure is formed over a second surface of the second encapsulant and electrically connected to the conductive vias to make the Fo-WLCSP stackable. Additional semiconductor die can be mounted over the first and second semiconductor die in a PoP arrangement.
Public/Granted literature
- US20130075936A1 Semiconductor Device and Method of Forming Interconnect Substration for FO-WLCSP Public/Granted day:2013-03-28
Information query
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