Invention Grant
- Patent Title: Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
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Application No.: US14488750Application Date: 2014-09-17
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Publication No.: US09683289B2Publication Date: 2017-06-20
- Inventor: Stefan Reber , Albert Hurrle , Norbert Schillinger
- Applicant: Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V.
- Applicant Address: DE München
- Assignee: Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V.
- Current Assignee: Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V.
- Current Assignee Address: DE München
- Agent Matthew B. Dernier, Esq.
- Priority: DE102005045582 20050923
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; C23C16/453 ; C23C16/458 ; C23C16/54
Abstract:
A device and a method for continuous chemical vapor deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.
Public/Granted literature
- US20150037500A1 Device And Method For Continuous Chemical Vapour Deposition Under Atmospheric Pressure And Use Thereof Public/Granted day:2015-02-05
Information query
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