Invention Grant
- Patent Title: Fabric having cut-loop structure, method for manufacturing same, and product using fabric having cut-loop structure
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Application No.: US14368678Application Date: 2013-05-03
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Publication No.: US09683319B2Publication Date: 2017-06-20
- Inventor: Hyun Sam Lee , Sung Hoon Choi
- Applicant: CLEMBON CO., LTD.
- Applicant Address: KR Seoul
- Assignee: Clembon Co., Ltd.
- Current Assignee: Clembon Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Sunstein Kann Murphy & Timbers LLP
- Priority: KR10-2012-0105095 20120921
- International Application: PCT/KR2013/003850 WO 20130503
- International Announcement: WO2014/046365 WO 20140327
- Main IPC: D04B1/04
- IPC: D04B1/04 ; D04B21/04 ; D03D27/08 ; D02G3/36 ; D03D1/00 ; D06M11/38 ; D03D11/00 ; D03D39/00 ; D06C11/00 ; D06M13/00 ; D06M101/06

Abstract:
The present invention provides fabrics with cut loop pile comprising a rayon core yarn and covering yarn of a split microfiber yarn and a manufacturing method thereof. The rayon core yarn at the section where said loops are cut is outwardly protruded from the covering yarn, wherein the rayon core yarn is separated into multiple filaments to function as hooks. The fabrics with cut loop pile show superior characteristics in polishing properties, sliding properties, water absorption properties, rapid drying properties and feeling of touch since polishing can be performed while easily catching foreign substances such as extremely minute dust particles or human hairs and the like by the hook-shaped rayon core yarn. Thus the fabrics with cut loop pile according to the present invention can be used usefully in products such as various kind of mats, towels, bathroom products, and the like including dishcloths and mops.
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