Invention Grant
- Patent Title: Linear Stage for reflective electron beam lithography
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Application No.: US13824079Application Date: 2012-09-06
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Publication No.: US09690213B2Publication Date: 2017-06-27
- Inventor: Upendra Ummethala , Layton Hale , Joshua Clyne , Samir Nayfeh , Mark Williams , Joseph A. Di Regolo , Andrew Wilson
- Applicant: Upendra Ummethala , Layton Hale , Joshua Clyne , Samir Nayfeh , Mark Williams , Joseph A. Di Regolo , Andrew Wilson
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- International Application: PCT/US2012/053927 WO 20120906
- International Announcement: WO2013/036615 WO 20130314
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01J37/20 ; H01J37/317 ; B82Y10/00 ; B82Y40/00

Abstract:
A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis.
Public/Granted literature
- US20130293865A1 Linear Stage for Reflective Electron Beam Lithography Public/Granted day:2013-11-07
Information query
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