Invention Grant
- Patent Title: Chemical synthesis device and method for manufacturing chemical synthesis device
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Application No.: US14742865Application Date: 2015-06-18
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Publication No.: US09694339B2Publication Date: 2017-07-04
- Inventor: Takashi Miyata
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2014-132273 20140627; JP2015-030329 20150219
- Main IPC: B01J19/00
- IPC: B01J19/00 ; B01J19/24 ; B32B37/00 ; B32B37/12 ; B32B37/14 ; B32B37/24
Abstract:
A chemical synthesis device that can easily control the temperature of a fluid in a channel is provided. An embodiment of a chemical synthesis device according to the invention includes a substrate provided with a first channel in which a plurality of fluids are subjected to a chemical synthesis and a second channel for controlling a temperature of the fluids flowing through the first channel.
Public/Granted literature
- US20150375191A1 CHEMICAL SYNTHESIS DEVICE AND METHOD FOR MANUFACTURING CHEMICAL SYNTHESIS DEVICE Public/Granted day:2015-12-31
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