Invention Grant
- Patent Title: Method for the production of a multilayer element, and multilayer element
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Application No.: US14186100Application Date: 2014-02-21
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Publication No.: US09694618B2Publication Date: 2017-07-04
- Inventor: Ludwig Brehm , Rene Staub
- Applicant: Leonhard Kurz Stiftung & Co. KG
- Applicant Address: DE Furth
- Assignee: LEONHARD KURZ STIFTUNG & CO. KG
- Current Assignee: LEONHARD KURZ STIFTUNG & CO. KG
- Current Assignee Address: DE Furth
- Agency: Hoffmann & Baron, LLP
- Priority: DE102009033762 20090717
- Main IPC: B42D15/00
- IPC: B42D15/00 ; B42D25/00 ; B42D25/45 ; B42D25/47 ; B42D25/29 ; B42D25/41 ; B42D25/328 ; B42D25/445

Abstract:
The invention relates to a method for producing a multilayer element (100), and also to a multilayer element (100) produced by said method. On and/or in a carrier ply (1) a decorative ply (3) is formed. The decorative ply (3) has a first region (8) and a second region (9). Viewed perpendicular to the plane of the carrier ply (1), the decorative ply (3) has in the first region (8) a first transmittance and in the second region (9) a second transmittance greater in comparison to the first transmittance. A layer (5) to be structured and a photoactivatable resist layer are disposed on the first side (11) of the carrier ply (1). On exposure of the resist layer through the decorative ply (3), the decorative ply (3) serves as an exposure mask. The at least one layer (5) to be structured and the resist layer are structured in register to one another by means of structuring operations synchronized with one another.
Public/Granted literature
- US20140227488A1 Method for the Production of a Multilayer Element, and Multilayer Element Public/Granted day:2014-08-14
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