Invention Grant
- Patent Title: Method for cleaning carbon nanotubes and carbon nanotube substrate and uses therefor
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Application No.: US14906971Application Date: 2014-07-18
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Publication No.: US09695046B2Publication Date: 2017-07-04
- Inventor: Heiko Hocke
- Applicant: Covestro Deutschland AG
- Applicant Address: DE Leverkusen
- Assignee: Covestro Deutschland AG
- Current Assignee: Covestro Deutschland AG
- Current Assignee Address: DE Leverkusen
- Agency: Drinker Biddle & Reath LLP
- Priority: DE102013214431 20130724
- International Application: PCT/EP2014/065467 WO 20140718
- International Announcement: WO2015/011034 WO 20150129
- Main IPC: B08B3/00
- IPC: B08B3/00 ; C01B31/02 ; H01M4/133 ; H01M4/96

Abstract:
The invention relates to a method for cleaning carbon nanotubes comprising the following steps: provision of a carbon nanotube substrate, first washing of the carbon nanotube substrate by means of an acid and second washing of the carbon nanotube substrate by means of a solution, wherein the solution has replacement anions of at least one of the acid radical anions of the acid of different type, and the substance amount fraction of the replacement anions in the solution is greater than the substance amount fraction of the anions in the solution corresponding to the acid radical anions of the acid. The invention further relates to a carbon nanotube substrate which can be obtained by such a method.
Public/Granted literature
- US20160167966A1 METHOD FOR CLEANING CARBON NANOTUBES AND CARBON NANOTUBE SUBSTRATE AND USES THEREFOR Public/Granted day:2016-06-16
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