Invention Grant
- Patent Title: Method for removing rare earth impurities from nickel-electroplating solution
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Application No.: US14346058Application Date: 2012-09-21
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Publication No.: US09695524B2Publication Date: 2017-07-04
- Inventor: Masanao Kamachi
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-212339 20110928; JP2011-237212 20111028
- International Application: PCT/JP2012/074151 WO 20120921
- International Announcement: WO2013/047340 WO 20130404
- Main IPC: C25D21/18
- IPC: C25D21/18 ; C25D3/12 ; C25D21/06 ; C25D7/00

Abstract:
[Object] When rare earth magnets are plated, components of the rare earth magnets are dissolved in the plating solution, causing plating defects. Thus, an easy method for removing rare earth impurities has been necessary.[Means for Solution] A nickel-electroplating solution containing rare earth impurities is kept at 60° C. or higher for a predetermined period of time to precipitate rare earth impurities for separation by sedimentation or filtration. Rare earth impurities can be precipitated further efficiently by adding precipitate to the nickel-electroplating solution, or by concentrating the nickel-electroplating solution by heating.
Public/Granted literature
- US20140224664A1 METHOD FOR REMOVING RARE EARTH IMPURITIES FROM NICKEL-ELECTROPLATING SOLUTION Public/Granted day:2014-08-14
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