Invention Grant
- Patent Title: Compositions comprising base-reactive component and processes for photolithography
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Application No.: US12966928Application Date: 2010-12-13
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Publication No.: US09696627B2Publication Date: 2017-07-04
- Inventor: Deyan Wang , Jinrong Liu , Cong Liu , Doris Kang , Anthony Zampini , Cheng-Bai Xu
- Applicant: Deyan Wang , Jinrong Liu , Cong Liu , Doris Kang , Anthony Zampini , Cheng-Bai Xu
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/32 ; G03F7/039 ; G03F7/004
Abstract:
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Public/Granted literature
- US20110255061A1 COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY Public/Granted day:2011-10-20
Information query
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