Invention Grant
- Patent Title: Method for forming pattern
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Application No.: US14430700Application Date: 2013-09-11
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Publication No.: US09697954B2Publication Date: 2017-07-04
- Inventor: Kenichi Nomura , Hirobumi Ushijima , Noriko Iwase , Manabu Yoshida
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-210892 20120925
- International Application: PCT/JP2013/074551 WO 20130911
- International Announcement: WO2014/050560 WO 20140403
- Main IPC: B05D5/12
- IPC: B05D5/12 ; H01G4/30 ; H05K3/20 ; C09D11/037 ; C09D11/52 ; H01G4/12 ; H01L31/0224 ; H05K3/12 ; H01G13/00 ; H01G4/228

Abstract:
The invention provides a process and an apparatus for producing a high quality electronic component by reducing sagging at pattern side walls, which may occur when patterns of a wiring, an electrode, etc. are printed by a screen printing process using an electroconductive paste, an insulation paste, or a semiconductor paste, and reducing a mesh mark on the patterns of a wiring, an electrode, etc., or a full solid surface film, as well as a pattern formation process, by which screen printing can be applied and double face printing can be conducted with the number of process steps less than a conventional process. A pattern is formed by that a pattern is printed on a blanket having a surface comprising polydimethylsiloxane using an electroconductive paste, an insulation paste, or a semiconductor paste by a screen printing process, and the pattern is transferred from the blanket to a printing object.
Public/Granted literature
- US20150243441A1 METHOD FOR FORMING PATTERN Public/Granted day:2015-08-27
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