Invention Grant
- Patent Title: Magnetron and high-frequency heating apparatus having the same
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Application No.: US14494689Application Date: 2014-09-24
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Publication No.: US09697977B2Publication Date: 2017-07-04
- Inventor: Seung Chul Yang , Dang Won Kim , Hak Jae Kim , Ki Whan Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Staas & Halsey LLP
- Priority: KR10-2013-0158481 20131218
- Main IPC: H05B6/64
- IPC: H05B6/64 ; H05B6/72 ; H01J23/10 ; H05B6/66 ; H01J25/50 ; H01J23/00 ; H01J23/20 ; H01J23/11 ; H01J25/587

Abstract:
A magnetron includes a yoke, an anode unit including an anode cylinder, radially arranged vanes, and first and second pole pieces at both sides of the anode cylinder, a cathode unit having a filament spaced apart from the vanes, and an output unit having an antenna lead connected to one vane to radiate high-frequency microwaves. The first pole piece includes a first flat portion, a slope at an inner side of the first flat portion, a second flat portion at an inner side of the slope and having a diameter of 9.5˜10.5 mm, a first hole formed in the second flat portion and having a diameter of 8˜8.2 mm, and a second hole formed in the slope for penetration of the antenna lead. The magnetron achieves higher and stabilized efficiency, restricted oscillation efficiency variation, lower energy consumption, and improved load stability without deterioration of oscillation efficiency.
Public/Granted literature
- US20150170866A1 MAGNETRON AND HIGH-FREQUENCY HEATING APPARATUS HAVING THE SAME Public/Granted day:2015-06-18
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