Invention Grant
- Patent Title: Thin film transistor, method of manufacturing the same, display unit, and electronic apparatus
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Application No.: US13849978Application Date: 2013-03-25
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Publication No.: US09698273B2Publication Date: 2017-07-04
- Inventor: Tomoatsu Kinoshita
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: Joled Inc.
- Current Assignee: Joled Inc.
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2012-080642 20120330
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66 ; H01L27/12

Abstract:
A thin film transistor includes: a gate electrode and a pair of source-drain electrodes provided on a substrate; an oxide semiconductor layer provided between the gate electrode and the pair of source-drain electrodes, the oxide semiconductor layer forming a channel; a protection film provided over whole of a surface above the substrate; and a gate insulating film provided on a gate electrode side of the oxide semiconductor layer, the gate insulating film having end faces part or all of which are covered with the pair of source-drain electrodes or with the protection film.
Public/Granted literature
- US20130256798A1 THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, DISPLAY UNIT, AND ELECTRONIC APPARATUS Public/Granted day:2013-10-03
Information query
IPC分类: