Invention Grant
- Patent Title: Magnetoresistive device and method of manufacturing same
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Application No.: US15081397Application Date: 2016-03-25
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Publication No.: US09698341B2Publication Date: 2017-07-04
- Inventor: Sarin A. Deshpande , Sanjeev Aggarwal
- Applicant: Everspin Technologies, Inc.
- Applicant Address: US AZ Chandler
- Assignee: Everspin Technologies, Inc.
- Current Assignee: Everspin Technologies, Inc.
- Current Assignee Address: US AZ Chandler
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01L43/08 ; G11B5/84 ; G11C11/16 ; H01L27/22 ; H01L43/02

Abstract:
A magnetoresistive-based device and method of manufacturing a magnetoresistive-based device using a plurality of masks. The magnetoresistive-based device includes magnetic material layers formed between a first electrically conductive layer and a second electrically conductive layer, the magnetic materials layers including a tunnel barrier layer formed between a first magnetic materials layer and a second magnetic materials layer. In one embodiment, the method may include removing the first electrically conductive layer and the first magnetic materials layer unprotected by a first mask, to form a first electrode and a first magnetic materials, respectively, and removing the tunnel barrier layer and the second magnetic materials layer unprotected by a second mask to form a tunnel barrier and second magnetic materials, and the second electrically conductive layer unprotected by the second mask to form, and a second electrode.
Public/Granted literature
- US20160211441A1 Magnetoresistive Device and Method of Manufacturing Same Public/Granted day:2016-07-21
Information query
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