Invention Grant
- Patent Title: Liquid ejection head production method and liquid ejection head production system
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Application No.: US15224050Application Date: 2016-07-29
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Publication No.: US09701110B2Publication Date: 2017-07-11
- Inventor: Yoshikazu Hishinuma , Tadashi Kyoso , Yasutoshi Hirabayashi , Satoshi Shimobayashi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-152105 20150731
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/21 ; B41J2/155

Abstract:
The production method for a liquid ejection head is provided, in which a first head module is set, a second candidate head module is selected, a first representative value of the first head module is acquired, a second representative value of the second candidate head module is acquired, an average value of the first representative value and the second representative value is derived, and the second candidate head module by which the derived average value is 0.76-fold or more and 1.24-fold or less of an average ejection volume target value is set as a second head module.
Public/Granted literature
- US20170028711A1 LIQUID EJECTION HEAD PRODUCTION METHOD AND LIQUID EJECTION HEAD PRODUCTION SYSTEM Public/Granted day:2017-02-02
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