Invention Grant
- Patent Title: Forming method of thermal insulation film
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Application No.: US14933599Application Date: 2015-11-05
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Publication No.: US09702052B2Publication Date: 2017-07-11
- Inventor: Naoki Nishikawa , Masaaki Tani , Hiroshi Hohjo
- Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA , KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
- Applicant Address: JP Aichi-ken JP Nagakute-shi
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA,KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA,KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
- Current Assignee Address: JP Aichi-ken JP Nagakute-shi
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-226775 20141107
- Main IPC: C23C28/00
- IPC: C23C28/00 ; C25D11/18 ; C25D11/04 ; C25D11/24

Abstract:
A forming method of a thermal insulation film, including: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powders and bringing the abrasive powders into the micro-pores located at the formed abraded surface; and a third step of forming a protection film on the abraded surface to produce a thermal insulation film including the anode oxidation coating film and the protection film.
Public/Granted literature
- US20160130716A1 FORMING METHOD OF THERMAL INSULATION FILM Public/Granted day:2016-05-12
Information query
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